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Linde Strengthens Relationship with Shanghai Huali Microelectronics with its New Air-Separation Plant

Linde Strengthens Relationship with Shanghai Huali Microelectronics with its New Air-Separation Plant

  • 23-Jan-2020 2:00 PM
  • Journalist: Peter Schmidt

Linde has started a new air separation unit to supply Nitrogen, high purity Oxygen and Argon to the 12-inch wafer product line of the Shanghai based Shanghai Huali Microelectronics Corporation (HLMC). Additionally, Linde will supply Hydrogen and Helium to HLMC. The new plant has on-site nitrogen generators and a compressed dry air (CDA) system. To meet China’s increasing demand for higher purity industrial gas products from electronic and semiconductor industry, Linde has specially designed a compact and energy efficient Nitrogen generator. HMLC is China’s leading semiconductor manufacturer which supports 28 to 14 nm nodes processing technology widely used in mobile communications, consumer electronics, smart cards, wearable electronics, automobiles and many other products. The new plant is yet another milestone in HLMC’s successful tie-up with Linde which has crossed several years. Linde envisions strong growth in China’s electronics industry which is strengthened due to its advanced technology, innovation and production capabilities.

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